From Photo to Pattern
Two Day Workshop
"From Photo to Pattern" is a great opportunity to focus solely on pattern design. We will spend two days learning how to create a pattern which can be then machine pieced. Using straight lines, curved lines or a combination of both you will have a master pattern suited to your skill level, which will be ready to go when you're home with your palette of fabric.
Designing a Pictorial Watercolor Quilt
Two day workshop (two 6 hour classes)
In the two day design class the student will have a selection of photos to choose from in order to learn design techniques. The student will design from scratch, their own pattern which can then be transformed into a beautiful watercolor quilt. Many students will be auditioning fabrics onto their design board by the second day.
High Key Design
One day workshop (6 hours)
This one day workshop offers students the opportunity to learn how to work in a very light palette, which I call high key design. Wendy will provide the students with a pattern which will allow them to learn the piecing technique, adding your own perfect 1/4” seam allowance to any curved piece, and sewing these curved pieces together. Much of the class will be learning how to work with specific types of fabrics in this very light palette, creating a watercolor effect.
Wendy will touch on how to make simple changes to her pattern as well as enhancing the piece with ink.
$20.00 kit fee (does not include fabric)
